WP3: Source technology development

Objective: This WP will be focused on solving the technology challenges involved in the design and development of sources based on hybrid technology.

Description: The plasma source material will be based on low –work function materials. The basic material will come from existing hollow cathode technology and will be fully analysed, moreover advanced materials will include, aluminosilicate inorganic polymers specifically manufactured to achieve non- isotropic properties. Different layouts of RF antennas will be tested in combination with different materials of the source. The best manufacturing technology for the plasma source as well as Additive Manufacturing Technology will be considered to obtain sophisticated plasma sources with complex geometry will be also investigated.

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